| 摘要 |
<p>PURPOSE:To allow the height of a pellicle frame to be varied and to allow the foreign matter stuck on the pellicle film to defocus without exchange of the pellicle by constituting the circular pellicle frame mounted to a photomask of an outside frame and an inside frame and connecting the inside frame and the outside frame by means of a screw. CONSTITUTION:The outside frame 5 attached with the pellicle film 1 is connected to the inside frame 6 by means of the screw and, therefore, if the outside frame 5 is rotated relative to the inside frame 6, its rotating motion is changed by the screw to the movement of the outside frame 5 in the direction perpendicular to the photomask 4 and the distance of the pellicle film 1 to the pattern face of the photomask 4 changes. The outside frame 6 is fixed by a lock screw 7 so as not to rotate of itself relative to the inside frame 5. The height of the pellicle frame is so changed as not to defocus and transfer the foreign matter on the pellicle film onto a semiconductor substrate.</p> |
