| 摘要 |
PURPOSE:To set a chip corner at an origin of inspection easily and accurately by arraying plural rectangular patterns which are smaller than a specific area on continuous prolongations of chip outer circumferential sides according to a specific rule. CONSTITUTION:A glass mask 20 is provided with the rectangular patterns 23a, 23b-, and 24a, 24b- on the continuous prolongations of outer circumferential sides 25a and 25b of a mask chip 21a in the (x) and (y) directions of the chip corner part A of the mask chip 21a. The rectangular patterns are arrayed at specific intervals (t), and the rectangular area of each pattern is set below the area wherein no pattern is formed on a semiconductor wafer surface in photoetching. For the purpose, one group of rectangular pattern is only found to move the glass mask 20 in parallel along the patterns, and thus the corner A is found and set at the origin of inspection of an inspecting device accurately. |
