发明名称 CLEANING DEVICE OF PLATE FOR STICKING WAFER
摘要 PURPOSE:To drastically reduce the physical load of a plate transfer time and to eliminate the need for making the whole cleaning device in a complicated structure, by making a means which supports the plate as a rail which is located at the upper and lower sides of the plate, and composing it so as to perform while rolling the plate, in case of transferring the plate to the cleaning tank of the next step. CONSTITUTION:A plate P located in a lift rail 22 is pushed in the left direction by a swing arm 50 with a transfer mechanism 34 being moved in the left direction, is passed through a fixed rail 28 like its being rolled and transferred to the lift rail 22 of the next cleaning tank. Thereafter the swing arm 50 is rotated downward, separated from the plate P and the swing arm 50 returns to the original position of the cleaning tank with the transfer mechanism 34 being moved in the right direction next. A hunger 26 is thereafter descended and the plate P located on each lift rail 22 is descended according to the descent of the lift rail 22, is dipped in a cleaning tank 20 and cleaned. After its cleaning for the specified time the lift rail 22 is ascended and becomes flush with the fixed rail 28.
申请公布号 JPH0482663(A) 申请公布日期 1992.03.16
申请号 JP19900195750 申请日期 1990.07.24
申请人 MIMASU HANDOUTAI KOUGIYOU KK 发明人 NAKADA KIYOSHI
分类号 B08B3/04;B24B7/00;B24B37/00;H01L21/304 主分类号 B08B3/04
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