| 摘要 |
<p>PURPOSE:To obtain the pellicle which exhibits excellent light resistance to exposing with UV rays and has the strength to withstand air blow by forming the pellicle of a fluorine polymer having a perfluoroalkyl ether ring structure and specifying the film thickness thereof to 0.5 to 10mum. CONSTITUTION:The film which consists of the fluorine polymer having the perfluoroalkyl ether ring structure having 0.5 to 10mum film thickness is formed as the central layer. The thin films which consist of a metal oxide or metal fluoride and have the refractive index n1 larger than the refractive index nF of the polymer are preferably provided as high-refractive index antireflection layers on both sides thereof. Further, the thin films which consist of a metal oxide or metal fluoride and have the refractive index n2 smaller n1 are provided as low-refractive index antireflection layers on both outer sides thereof. The pellicle which have the sufficient light resistance even to exposing with UV rays and the strength to withstand the air blow and has the high ray transmittance at wavelengths near 436nm (g ray), 365nm (i ray) and further 248nm is obtd. in this way.</p> |
