| 摘要 |
<p>The method of producing contamination-free pellicles and the pellicles produced by the method are adapted to prevent particulate contamination to the interior surface of a pellicle film. The preferred embodiment of the method includes the steps of selecting an appropriate planar cover sheet, applying a layer of contact adhesive to one surface of the cover sheet and detachably installing the cover sheet on a pellicle with the adhesive surface facing inward and forming a sealed interior volume with the pellicle. The contamination-free pellicles (10) include a preselected cover sheet (12) attached to a conventional pellicle (14) including a support ring (16) and a transparent film (18). The cover sheet (12) is provided with a contact adhesive (20) on the interior surface to capture and retain particulate matter within the sealed interior volume (19). The contamination-free pellicles (10) substantially reduce the risk of particulate contamination to the film (18) and are thus extremely useful in photomask processes in the electronics industry.</p> |
