发明名称 IMPROVEMENT OF X-RAY DIFFRACTION MICROSCOPY AND APPARATUS THEREFOR
摘要 PURPOSE:To obtain an X-ray diffraction microscopy and an apparatus therefor which enable attainment of a topography of the whole of a sample, by scanning a sample surface while adjusting the direction of a single-crystal plate for an incident X-ray and by other means. CONSTITUTION:An X-ray applied from an X-ray source 1 is restricted to a spot-like incident X-ray by two slits 2 and 3. The X-ray passing through these slits falls on a single-crystal plate 4. The single-crystal plate 4 is fitted to a goniometer head 13, and the goniometer head 13 can be rotated around three axes of an X-axis 9, a Y-axis 7 and a Z-axis 8 and also can be moved in parallel in three directions of the X-axis, the Y-axis and the Z-axis. The incident X-ray is diffracted in the direction satisfying the Bragg condition. A slit plate 5 fixed in a space is provided on the opposite side of the single-crystal plate 4, while an X-ray film 6 moving together with a sample is provided outside the slit plate, and an image of the diffracted X-ray is taken on the film. When the image is taken, the sample is moved in the directions of the three axes and scanned by the spot-like X-ray.
申请公布号 JPH0474953(A) 申请公布日期 1992.03.10
申请号 JP19900188188 申请日期 1990.07.16
申请人 SUMITOMO ELECTRIC IND LTD 发明人 NAKAGAWA MASAHIRO;SHIRAKAWA FUTATSU
分类号 G01N23/20 主分类号 G01N23/20
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