| 摘要 |
Chip pattern data, regarding a chip pattern including a chip circuit pattern, a scribe frame pattern which surrounds the chip circuit pattern and which becomes an overlapped region between the chip patterns arranged adjacently each other, and subsidiary patterns located in the scribe frame pattern are applied in a step-and-repeat process for fabricating a photomask are verified by: producing simulation pattern data, from the chip pattern data, for arranging a designated number of chip patterns in the same way as done in the step-and-repeat process; providing a visual image of the simulation pattern from the simulation pattern data; and visually observing, through the visual image, the chip and in particular, the subsidiary patterns appearing in the same state as in the step-and-repeat process.
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