| 摘要 |
PURPOSE:To obtain a chemical-liquid treatment apparatus which maintains the purity of a chemical liquid, whose installation cost is low and whose failure rate is small by a method wherein a chemical-liquid supply system which includes a tank for reserve use, an opening and shutting valve and a sensor detecting a chemical-liquid level inside the tank is united and a control circuit which transmits the operation of a chemical-liquid treatment part to the chemical-liquid treatment part is installed. CONSTITUTION:A wafer is first prepared at a chemical-liquid treatment part. When the treatment part is set to an operation state, a chemical-liquid treatment control circuit 15 transmits a signal requesting to feed a chemical liquid to a chemical-liquid supply control circuit 16a. Thereby, the chemical-liquid supply control circuit 16a confirms that either of float sensors 4a and 6a is detecting the signal. When the upper-limit float sensor 4a detects the signal, a signal capable of feeding a chemical liquid is transmitted to the chemical-liquid treatment control circuit and, at the same time, a valve 10a is opened. The chemical liquid is supplied to the chemical-liquid treatment part. When the treatment of the wafer is completed at the chemical-liquid treatment part, a signal to stop feeding a chemical liquid is sent from the chemical-liquid treatment control circuit 15, the chemical-liquid supply control circuit 16 shuts the valve 10a, a three-way valve 3 is changed over, a buffer tank 1a is set to a reduced- pressure state, a power 8a is opened and a chemical liquid is supplemented from a chemical- liquid storage source. A chemical-liquid supply part supplements and supplies the chemical liquid automatically when the chemical-liquid treatment part is operated. |
