发明名称 LITHOGRAPHIC PHOTOSENSITIVE RESIN PLATE
摘要 PURPOSE:To obtain a lithographic plate not requiring dampening water, by forming an ink-repelling silicone compound layer on a nonimage-line part. CONSTITUTION:A photosensitive resin layer is formed on a support made of a metal or plastic film having an adhesive subbing layer made of a synthetic resin or not, and this photosensitive layer is coated with a trivalent chromium complex salt of a carboxylic acid having a polyorganosiloxane residue as a nonphotosensitive silicone compound. An organic carboxylic acid trivalent chromium complex salt is strongly combined with the surface of a base material having generally OH, carboxy, acidamide, sulfo, or the like groups in its molecular chain, such as paper, filber, glass fiber, plastic film, and being ready to be negatively charged on its surface upon contact with a solvent. as an organic residue of this chromium complex salt, a mono- or divalent polyvalent carboxylic acid made of polyorganosiloxane having such a structure as represented by the formula shown is used.
申请公布号 JPS5710145(A) 申请公布日期 1982.01.19
申请号 JP19800084444 申请日期 1980.06.20
申请人 TOYO BOSEKI 发明人 WADA MINORU;TOMITA AKIRA;NISHIWAKI TOSHIKAZU;ETOU KUNIOMI;TANAKA SHINICHI;FUJIMURA TOSHIAKI;IGUCHI MITSUO
分类号 G03F7/09;C08G77/00;C08G77/06;C08G77/22;C08G77/38;G03F7/00;G03F7/075 主分类号 G03F7/09
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