| 摘要 |
PURPOSE:To prevent the transfer of a line or dot other than a desired transfer figure by adding a radical polymerizable monomer, a photopolymerization initiator and minute glass globules to a negative type photosensitive masking layer. CONSTITUTION:A marking agent is applied to a base material to form a marking layer and a negative type photosensitive masking composition is applied to the marking layer to form a negative type masking layer. The photosensitive masking composition is based on a monomer having a radical polymerizable group and a photopolyamerization initiator and, if necessary, a sensitizer and a viscosity control agent may be added to said composition. Further, by compounding minute glass globules with the photosensitive masking composition, it is prevented that the thermal transfer ink provided under the photosensitive masking layer exudes from the minute crack layer formed after the photosensitive masking layer is cured. By this method, a line or dot other than a desired transfer figure can not be thermally transferred. |
