发明名称 X-Ray lithography mask and method for producing same.
摘要 <p>An X-ray lithography mask comprising an X-ray transparent film (1) made from diamond, X-ray absorber patterns (4) deposited on the X-ray transparent film and diamond crosspieces (2) shaped on the diamond X-ray transparent film for reinforcing the diamond X-ray transparent film. Since both the transparent film (1) and the reinforcing crosspieces (2) are made from diamond, no thermal stress is induced by the change of temperature. The mask excels in transmittance for X-ray, flatness and strength. <IMAGE></p>
申请公布号 EP0473332(A1) 申请公布日期 1992.03.04
申请号 EP19910307478 申请日期 1991.08.13
申请人 SUMITOMO ELECTRIC INDUSTRIES, LIMITED 发明人 IMAI, TAKAHIRO;FUJIMORI, NAOJI
分类号 G03F1/22;H01L21/027 主分类号 G03F1/22
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