| 摘要 |
A gas in a process chamber, such as a sputtering chamber, having a typical inside pressure of 10-1 to 10-3 Torr, is analyzed by a mass spectrometer, which should be used at a pressure range of lower than around 10-4 Torr. The method comprises evacuating a process chamber by a vacuum pump and supplying a gas to the process chamber, whereby a pressure in the process chamber is determined by the vacuum pump and the supplied gas, and that pressure in the process chamber is higher than a pressure in the vacuum pump, and analyzing the gas at a portion of or around the vacuum pump, which portion has a pressure lower than the pressure in the process chamber, by using a mass spectrometer.
|
