发明名称 |
Process for preparing a monomolecular built-up film |
摘要 |
A process for producing a monomolecular built-up film of monomolecular layers of a silane surfactant is described. In the process, the silane surfactant is chemically adsorbed on a hydrophilic surface of a substrate and is subjected to irradiation of a high energy beam or plasma treatment in an active gas atmosphere to activate the monomolecular layer. This activated layer is further adsorbed with the silane surfactant to form a built-up film. The beam irradiation or plasma treatment may be effected in a desired pattern. The beam irradiation or plasma treatment and the further adsorption are repeated until the desired number of the monomolecular layers is obtained.
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申请公布号 |
US5093154(A) |
申请公布日期 |
1992.03.03 |
申请号 |
US19890402183 |
申请日期 |
1989.09.05 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.;JAPAN ATOMIC ENERGY RESEARCH INSTITUTE |
发明人 |
HATADA, MOTOYOSHI;OGAWA, KAZUFUMI;TAMURA, HIDEHARU |
分类号 |
B05D1/20;B05D1/18;C08F30/08;C09D4/00 |
主分类号 |
B05D1/20 |
代理机构 |
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主权项 |
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地址 |
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