发明名称 Process for preparing a monomolecular built-up film
摘要 A process for producing a monomolecular built-up film of monomolecular layers of a silane surfactant is described. In the process, the silane surfactant is chemically adsorbed on a hydrophilic surface of a substrate and is subjected to irradiation of a high energy beam or plasma treatment in an active gas atmosphere to activate the monomolecular layer. This activated layer is further adsorbed with the silane surfactant to form a built-up film. The beam irradiation or plasma treatment may be effected in a desired pattern. The beam irradiation or plasma treatment and the further adsorption are repeated until the desired number of the monomolecular layers is obtained.
申请公布号 US5093154(A) 申请公布日期 1992.03.03
申请号 US19890402183 申请日期 1989.09.05
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.;JAPAN ATOMIC ENERGY RESEARCH INSTITUTE 发明人 HATADA, MOTOYOSHI;OGAWA, KAZUFUMI;TAMURA, HIDEHARU
分类号 B05D1/20;B05D1/18;C08F30/08;C09D4/00 主分类号 B05D1/20
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