发明名称 Device for measuring temperature of object in vacuum environment
摘要 A device for the measurement of a temperature in a relatively low range having the lower limit of below 100 DEG C. is proposed. The device is suitably used for measuring a temperature of a substrate 4 during a sputtering treatment in a vacuum environment. Infrared rays radiated from the substrate 4 in a vacuum chamber 1 are collected by an optical lens 13 mounted in a freely movable probe 10 via a mirror (15) provided in a hood 14 attached to a front end of the probe (10) for deflecting the incident rays to the lens 13. The collected rays are led outside the chamber 1 to a sensor through a fluoride fiber 8 optically connected to the lens 13. The fiber 8 is enveloped in an air-tight manner within a metal bellows 9. A pipe 20, 24 for feeding a coolant extends in a circulating manner through the interior of the bellows 9 between a coolant source 30 and the probe 10, to suppress the radiation of infrared rays from the probe 10, hood 14 and mirror 15, and to reduce disturbance to the detected substrate temperature value. A combination of an MCT sensor composed of Hg, Cd and Te and a chalcogen fiber composed of Ge, As, Se and Te is also proposed for the measurement of relatively low temperature ranges. A system for controlling a substrate temperature during the sputtering process while using the above device is also proposed.
申请公布号 US5092680(A) 申请公布日期 1992.03.03
申请号 US19900527307 申请日期 1990.05.23
申请人 FUJITSU LIMITED 发明人 KOBAYASHI, KAZUO;SATO, AYAHIKO;UEHARA, YUJI;SAWADA, SHIGETOMO
分类号 G01J5/04;G01J5/08 主分类号 G01J5/04
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