发明名称 FORMATION OF HIGH-TEMPERATURE SUPERCONDUCTING OXIDE THIN FILM
摘要 <p>PURPOSE:To form the uniform thin film of a high-temp. superconducting oxide on a substrate at a low cost by placing water, the substrate and a high-temp. superconducting oxide in a pressure vessel, heating and pressurizing the vessel to melt the oxide and changing the temp. or pressure to precipitate the supersaturated oxide. CONSTITUTION:Water 6, a substrate 5 and a high-temp. superconducting oxide 7 (e.g. Y-Ba-Cu-O-based superconductor) as a solute are placed in the pressure vessel 2 of a thin film forming device 1. The vessel 2 is heated by a heating and cooling device 3 and simultaneously pressurized to convert the water 6 to supercritical water under high temp. and pressure conditions to dissolve the oxide 7 in the supercritical water. The temp. or pressure in the vessel 2 is then decreased to precipitate the oxide 7, the precipitate is deposited on the substrate 5 to form its thin film, and the thin film of the high-temp. superconducting oxide is obtained.</p>
申请公布号 JPH0465305(A) 申请公布日期 1992.03.02
申请号 JP19900172792 申请日期 1990.07.02
申请人 SUMITOMO HEAVY IND LTD 发明人 NISHIKAWA HIDEKAZU
分类号 C01B13/14;C01G1/00;C01G3/00;C30B29/22 主分类号 C01B13/14
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