| 摘要 |
PURPOSE:To prevent the occurrence of peeling and adhesion defect of a metallic film by beforehand cleaning the surface of an electric element through ion sputtering then vapor depositing the metallic film. CONSTITUTION:A quartz vibrator 1 covered with a mask other than a metallic film forming part is put into a vacuum case 6, and the inside of the case 6 is evacuated to <=10<-4> torr. Voltage of several KeV is applied with the vibrator as a negative pole between an ion gun 7 provided with an Ar source 9 and an Ar ionization device 8 and the vibrator 1. Ar ions are emitted from the gun 7, and collide against the vibrator 1, thereby completely sputtering and removing the impurities, such as org. materials, stuck on the part exposed from the mask. Next, the vibrator 1 is moved to the front of a metallic vapor generator 11, and is vapor deposited thereon with metallic vapor, after which the mask is removed. |
