发明名称 PHOTOSENSITIVE COMPOSITION
摘要 PURPOSE:To enhance developability and to decrease the residual films after developing by incorporating a high-molecular straight chain acid anhydride into the photosensitive compsn. CONSTITUTION:A quinone diazide compd. (A) as a photosensitive component, an alkali-soluble resin (B) as a binder and the high-molecular straight chain acid anhydride (C) as a residual film improving agent are incorporated into this compsn. A compd. having an o-naphthoquinone diazide group, etc., are usable for the component A, a novolak resin, etc., for the component B and the compd. of formula, etc., for the component C, respectively.
申请公布号 JPH0463350(A) 申请公布日期 1992.02.28
申请号 JP19900175683 申请日期 1990.07.03
申请人 MITSUBISHI KASEI CORP;KONICA CORP 发明人 SASAKI MITSURU;NAKAI HIDEYUKI;ISHII NOBUYUKI
分类号 G03F7/022;H01L21/027 主分类号 G03F7/022
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