Photo resist stripper compositions comprising N-alkyl-2-pyrrolidone, 1,2-propanediol and tetraalkylammonium hydroxide. The photoresist strippers are useful at high stripping temperatures (105 DEG C.-125 DEG C.) to remove hard baked photoresist without damaging semiconductor substrates or metallurgy.
申请公布号
US5091103(A)
申请公布日期
1992.02.25
申请号
US19900517105
申请日期
1990.05.01
申请人
DEAN, ALICIA;FITZSIMMONS, JOHN A.;HAVAS, JANOS;MCCORMICK, BARRY C.;SHAH, PRABODH R.
发明人
DEAN, ALICIA;FITZSIMMONS, JOHN A.;HAVAS, JANOS;MCCORMICK, BARRY C.;SHAH, PRABODH R.
