| 摘要 |
PURPOSE:To expose a pattern, which has a measure of regularity, at high speed by distributing opening regularly within, at least, one block pattern area of a stencil mask 1. CONSTITUTION:A plurality of block patterns areas are made in a stencil mask 1, and in one of them are arranged regularly a plurality of openings 5-1. Next, these openings are provided with a pair of blanking electrodes 8-1 and 9-1 respectively. And according to the pattern to be exposed, desired voltage is applied to each electrode, and a charged particle beam 3 is applied on the region 4-1. As a result, the beam 3, which is selectively let penetrate, is applied on a water, and the exposure pattern 7 according to application voltage pattern is formed. |
