| 摘要 |
<p>PURPOSE:To hold a wafer with force applied only to the surface thereof by installing a suction means, which has a reference face to the periphery of the surface of the wafer into which a charged particle beam enters and includes a thin film insulating layer formed on the reference face. CONSTITUTION:A wafer 10 is carried into space made by an upper plate 1b and feet 1c with an electrostatic suction apparatus 9 and applied to the deposition film 3 of a reference face 2 by lifting the electrostatic suction apparatus 9. When the application is detected by for example increase in the load of the lifting motor of the electrostatic suction apparatus 9, the detection signal applies voltages as high as +100V and -100V to electrodes 4a and 4b respectively. Thereby the wafer 10 is electrostatically attached to a reference block 1.</p> |
