| 摘要 |
PURPOSE:To reduce damages by the inflow of the charged particles of a substrate in a planar magnetron type sputtering device by combining respective magnetic pole terminals with magnetic field control means consisting of permanent magnets and soft magnetic materials. CONSTITUTION:The 3rd magnetic terminal 24 of a soft magnetic material is provided to magnetic pole terminals 22, 23 of magnetic materials and permanent further an energizing coil 24a is provided to intermediate space of the terminals 22, 24. The respective magnetic pole terminals are coupled magnetically by a yoke 26. An anode 30 of a central part is provided to the anode 29 around a disc-like flat plate 21 which is a target. A negative voltage is applied to a cathode 27, a voltage near the ground is applied to the anode 30 and the anode 29 and the vacuum vessel are grounded, then while the inflow of the charged partices to the substrate to be formed with film is held decreased, glow discharge is caused and sputtering is effected. If the energizing current to be supplied to the coil 24a is changed, the point where the magnetic lines of force parallel with the plate 21 is moved and the plasma region can be consequently moved. |
