发明名称 Versatile substrate holder for semiconductor wafer prodn. - uses deepened well with central mesa to support wafer
摘要 A substrate-holder (3) used in the automatic the substrate (1) on a mesa (5) raised in the centre of a containing well (6), thus providing space for the circulation of etching or cleaning fluids. The mesa and well edges (6) are chamfered to assist fluids. The mesa and well edges (6) are chamfered to assist fluid flow underneath the substrate and a hole at the mesa centre (7) may be used for holding the substrate in position by external suction. ADVNATAGE - Well and mesa dimensions chosen to accommodate substrates over wider range of dimensional tolerance and mfg. processes.
申请公布号 DE4026244(A1) 申请公布日期 1992.02.20
申请号 DE19904026244 申请日期 1990.08.18
申请人 ANT NACHRICHTENTECHNIK GMBH, 7150 BACKNANG, DE 发明人 SCHMITT, REINHOLD, DR.RER.NAT., 7152 ASPACH, DE;SCHWADERER, BERNHARD, DR.-ING., 7153 WEISSACH, DE
分类号 H01L21/68;H01L21/683 主分类号 H01L21/68
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