发明名称 COATING COMPOSITION FOR PHOTORESIST
摘要 PURPOSE:To lessen the toxicity of the compsn. and to enhance the coatability and preservable stability by using a specific compd. as a solvent. CONSTITUTION:The compd. expressed by formula is used as the solvent of the compsn. contg. an alkaline-soluble resin, a photosensitive agent contg. an orthoquinone diazide group and the solvent. In the formula, R<1> denotes 1 to 3C alkyl group; R<2>, R<3> denote H or 1 to 3c alkyl group; 3-hydroxy-3-methyl-2- butanone, etc., are usable as the solvent of the formula. A prescribed novolac resin, etc., are usable as the above-mentioned resin and the ester compd. of the 1, 2-naphthoquinonediazide-5-sulfonic acid of 2, 3, 4, 4'- tetrahydroxybenzophenone, etc., are respectively usable as the above-mentioned photosensitive material.
申请公布号 JPH0452646(A) 申请公布日期 1992.02.20
申请号 JP19900163181 申请日期 1990.06.21
申请人 MITSUBISHI KASEI CORP 发明人 NISHI MINEO;MIYAZAKI AKIO
分类号 G03F7/022;H01L21/027 主分类号 G03F7/022
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