发明名称 SHIELDING FOR ARC SUPPRESSION IN ROTATING MAGNETRON SPUTTERING SYSTEMS
摘要 <p>A cathode body (12) for a rotating cylindrical magnetron (10) wherein the magnetron provides a sputtering zone extending along the length of the cathode body (12) and circumferentially along a relatively narrow region thereof. The cathode body (12) includes an elongated tubular member (14) having a target material (16) at the outer surface thereof. A collar (32) of electrically-conductive material is located at at least one end of the tubular member (14), and extends along the tubular member (14) from that one end into the erosion zone. A sleeve of electrically-conductive material may extend circumferentially around the collar (32).</p>
申请公布号 WO1992002659(A1) 申请公布日期 1992.02.20
申请号 US1991005304 申请日期 1991.07.31
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