发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND MANUFACTURE OF PHOTOSENSITIVE FILM AND PRINTED CIRCUIT BOARD BY USING SAME
摘要 PURPOSE:To obtain the photosensitive resin composition capable of forming a phosphorescent resist, the photosensitive film and a printed circuit board both using the composition by incorporating a phosphorescent compound. CONSTITUTION:The photosensitive resin composition comprises of a nongaseous ethylenically unsaturated compound having at least 2 C=C double bonds polymerizable by irradiation with active rays, a photopolymerization initiator and/or its derivative to be activated by irradiation with the active rays, a thermoplastic resin binder, a phosphorescent compound, and an organic halogen compound, thus permitting the photosensitive resin composition capable of forming a phosphorescent resist, the photosensitive film and the printed circuit board both using it to be obtained.
申请公布号 JPH0451047(A) 申请公布日期 1992.02.19
申请号 JP19900159331 申请日期 1990.06.18
申请人 HITACHI CHEM CO LTD 发明人 MASAOKA KAZUTAKA;YAMAZAKI HIROSHI
分类号 G03F7/027;G03F7/028;H01L21/027 主分类号 G03F7/027
代理机构 代理人
主权项
地址