发明名称 POSITIVE TYPE RADIATION SENSITIVE RESIST COMPOSITION
摘要 PURPOSE:To obtain the positive type resist which has all of a sensitivity, resolving power, heat resistance, and adhesive property in combination by adding a phenolic compd. having a specific structure to the resist compsn. CONSTITUTION:The alkaline soluble resin contg. the phenolic compd. expressed by formula I and the radiation sensitive component are incorporated into this compsn. In the formula I, R denotes a hydrogen atom, lower alkyl group or phenyl group; R' denotes an alkyl group or alkoxyl group; (n) denotes 0 or >=3 integer. R' is particularly preferably 1 to 5C alkyl group, methoxy group, ethoxy group. The positive type resist which is excellent in the sensitivity, resolving power, heat resistance, and adhesive property is obtd. in this way.
申请公布号 JPH0450851(A) 申请公布日期 1992.02.19
申请号 JP19900156877 申请日期 1990.06.14
申请人 SUMITOMO CHEM CO LTD 发明人 MORIBA HIROSHI;OZAKI HARUKI;HIOKI TAKESHI;KAMIYA YASUNORI
分类号 G03F7/039;C07C39/15;G03F7/022;H01L21/027 主分类号 G03F7/039
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