| 摘要 |
PURPOSE:To prevent the adhesion of the dust remaining after development to photoresist patterns by providing an air speed detector in the mid-way of an exhaust duct for exhausting the atmosphere in a processing chamber and further providing an exhaust pipe connected to a part of the processing chamber and a servo valve for regulating the exhaust capacity of the exhaust pipe and thereby maintaining the always specified exhaust capacity of the processing chamber atmosphere. CONSTITUTION:A wafer 1 is vacuum attracted to a chuck 3 in the processing chamber 2 and is processed with a liquid chemical. While the atmosphere in the processing chamber 2 is sucked toward (a) from the exhaust pipe 4 mounted in a part of the processing chamber 2, the exhaust duct 9 is mounted in the upper part of the processing chamber 2 and the atmosphere in the chamber is mainly exhausted from this exhaust duct 9. The wind velocity detector 5 mounted in the exhaust duct 9 at this time measures the air speed and sends the measurement signal to a controller 6 at all times. The controller compares the signal with a reference wind velocity and sends only the difference thereof as a pulse signal to a motor 8 which operates a damper 7 to open and close. The exhaust capacity of the exhaust device is kept monitored at all times and the damper which is a servo valve is operated to maintain the specified exhaust capacity. |
