发明名称 |
Positive type photoresist composition. |
摘要 |
<p>A positive type photoresist composition contains (a) 100 parts by weight of a resin which is a polymer compound (A) including carbon-carbon double bonds and having a molecular weight of 300 to 30,000 and an iodine value of 50 to 500. To at least a part of the double bonds of the polymer compound (A), a group represented by the formula (I) is introduced <CHEM> wherein R<1> denotes a hydrogen atom, a halogen atom or an alkyl group having 1 to 3 carbon atoms and R<2> denotes an alkyl group having 1 to 10 carbon atoms, a cycloalkyl group or an aryl group. The composition further contains (b) 25 to 100 parts by weight of a compound containing a quinone diazide unit.</p> |
申请公布号 |
EP0471326(A1) |
申请公布日期 |
1992.02.19 |
申请号 |
EP19910113522 |
申请日期 |
1991.08.12 |
申请人 |
NIPPON OIL CO., LTD. |
发明人 |
YODA, EIJI;SATO, HARUYOSHI, NISSEKI KAGAKU SHATAKU;YAMASITA, YUKIO;YUASA, HITOSHI;OTSUKI, YUTAKA |
分类号 |
C08F8/46;G03F7/023;H01L21/027;H01L21/30;H05K3/00;H05K3/06 |
主分类号 |
C08F8/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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