发明名称 CONTROL METHOD OF ARGON REFINING DEVICE
摘要 PURPOSE:To remove oxygen from material argon and obtain high-purity argon gas by a method wherein the absolute amount of hydrogen, consisting of two times of the absolute amount of oxygen in the material argon plus several percent of the absolute amount of oxygen, is operated as the adding amount of hydrogen, necessary for reaction between the oxygen in the material argon while the adding amount of hydrogen is regulated by an operated value. CONSTITUTION:The absolute amount of hydrogen, obtained as the result of operation, is given to a setting mechanism of the flow meter 15 of adding hydrogen by the signal of electricity or air. On the other hand, the adding hydrogen is supplied from a pipe 2 and is joined with material argon at a joining point 5 through a regulating valve 34, then, is supplied to a catalyst tank 6. The regulation of the adding amount of hydrogen is applied automatically on the amount of hydrogen of the result of operation by the combination of an amount of adding hydrogen regulating meter 15 and a regulating valve 3. The material argon is joined at the joining point 5 with the adding hydrogen and, thereafter, adding hydrogen is reacted with oxygen in the material argon in a catalyst tank 6 as shown by a formula 2H2+O2 2H2O while oxygen in the material argon is replaced with moisture and is supplied to a dehydrating device 8 through a pipe 7. The moisture in the material argon is removed in said dehydrating device 8 and is supplied to a supplying part as the argon gas, not containing oxygen, from a pipe 9.
申请公布号 JPH0448187(A) 申请公布日期 1992.02.18
申请号 JP19900155214 申请日期 1990.06.15
申请人 HITACHI LTD;HITACHI TECHNO ENG CO LTD 发明人 KAWATANI TADAHISA;TASAKA YASUO;YANAGII TOSHIAKI
分类号 F25J3/02;F25J3/04;F25J3/08 主分类号 F25J3/02
代理机构 代理人
主权项
地址