| 摘要 |
CONTROLLED FLOW VAPORIZER A vaporizing apparatus delivers precisely controlled, substantially continuous and monitored vapor flows for uses such as in plasma enhanced vapor deposition. The vaporizing apparatus comprises a fluid passageway along which are a pumping means, a vaporizing means, and a flowing means, all in fluid communication with the passageway. The vaporizing means vaporizes liquid pumped from the pumping means and includes a heat sink layer, a heated layer, and a portion of the passageway sandwiched therebetween. The vaporizing apparatus can sustain a flow of organosilicon vapor at a flow rate of about 1 to about 100 SCCM for as long as desired. |
