| 摘要 |
PURPOSE:To perform dry etching keeping constantly the inside of a dry etching tank cleanly by method wherein impurity absorbing members are provided detachable freely on the inside walls of the etching tank. CONSTITUTION:The members 8 to absorb impurities generated by etching are provided detachable freely on the side walls of the etching tank 4, and traditional reactive etching is performed. The member 8 is consisted of glass wool, Al or stainless steel being formed unevenness on the surface thereof. By this constitution, cleanness of the inside of tank can be kept constantly by exchanging the members 8 properly, and the semiconductor device having favorable characteristic can be obtained. |
