ETCHING SOLUTION FOR SILICON OXIDE FILM,申请号JP19900154698-传众专利搜索

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发明名称	ETCHING SOLUTION FOR SILICON OXIDE FILM
摘要
申请公布号	JPH0445531(A)	申请公布日期	1992.02.14
申请号	JP19900154698	申请日期	1990.06.13
申请人	NEC CORP	发明人	WATANABE KAORI
分类号	H01L21/306;H01L21/308	主分类号	H01L21/306
代理机构		代理人
主权项
地址

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