| 摘要 |
PURPOSE:To obviate the generation of thermal decomposition of an org. material by irradiating the surface of a substrate on which grooves are formed with an ICB of an org. material to deposit the single crystal of this org. material by evaporation in the grooves and growing the single crystal. CONSTITUTION:The straight grooves 11b are formed by photolithography and etching on the surface 11a of the substrate 11 consisting of glass, plastic, etc., and the substrate surface 11a thereof is irradiated with the ion cluster beam (ICB) of the org. material to deposit the single crystal of the org. material in the grooves 11b and to grow the single crystal. The material to be deposited by evaporation is the org. material but there is no need for melting this material in the case of vapor deposition of the org. material on the substrate 11 and, therefore, the thermal decomposition does not arise. The clusters of the material to be deposited by evaporation collide against the substrate 11 and are thereby moved and diffused. The thickness of the optical waveguide is controlled uniformly to a desired value without generating thermal decomposition of the org. nonlinear optical material in this way. |
