| 摘要 |
PROBLEM TO BE SOLVED: To three-dimensionally control a pattern shape, and finish it as in design dimension, in case of patterning a thick film glass layer by a sand blast method. SOLUTION: In a method for performing patterning of a thick film glass layer 4 by a sand blast method after a mask layer 5 having sand blast resistance is formed on the thick film glass layer 4 at least containing an inorganic glass powder and a resin binder formed on a base material 1, sand blast work is performed so that a sectional shape of the thick film glass layer 4 satisfies a condition of formulae: Wm×0.75<=Wgt<=Wm×0.95, Wm×1.00<=Wgb<=Wm×1.20 (where, Wm represents line width of the mask layer, Wgt represents line width in thick film glass layer upper end part after sand blast work, Wgb represents line width in thick film glass layer lower end part after sand blast work).
|
