发明名称 HEIGHT MICROMETER CORRECTION SYSTEM USING LASER INTERFERENCE EQUIPMENT
摘要 A correcting device for height micrometer uses laser interference to improve the accuracy and to reduce the correcting time. The said device includes a height micrometer (H) equipped with gage blocks (G)(G') to be corrected, and the micrometer is set on a surface plate (1) with a correcting device (2) sitting opposite to it. The device (2) has a two-stage feeding member (4) moving along the cylindrical column (3) by a step motor (S). The one stage of the feeding member installs a laser reflector (corner cube) (5) moving horizontally by another step motor (S1) and an electric micrometer (E) attaching a measuring hand (6). A laser interferometer (11) is installed on the top of the correcting device.
申请公布号 KR920001309(B1) 申请公布日期 1992.02.10
申请号 KR19890006260 申请日期 1989.05.10
申请人 KOREA STANDARD RESRARCH INSTITUTE 发明人 CHUNG, MYONG - SE;WOO, IN - HUN;OM, TAE - BONG;LIM, JAE - SUN;YANG, SANG - HEE
分类号 G01B3/18;(IPC1-7):G01B3/18 主分类号 G01B3/18
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