发明名称 FORMATION OF COLOR FILTER
摘要 PURPOSE:To reduce ruggedness on the surface of a color filter by using color regist adjusted by dispersing pigment contained in a negative regist material and forming the edge shape of a previously formed pattern consisting of picture elements having other hue without forming a forward taper. CONSTITUTION:Red color resist is applied by a spin coater, the resist film is prebaked for 2 minutes at 70 deg.C, an oxygen insulating film is applied, dried, and then irradiated with ultraviolet light from an extra-high voltage mercury lamp through a photomask, and the irradiated face is developed by an alkaline developer and dried, and then the whole surface is irradiated with ultraviolet rays of high brightness by a high voltage mercury lamp to cure the surface. Then, green color regist is formed by a similar process. In said processes, the color resist is formed to have a pattern edge almost vertical to the base and the green color resist is formed to have a pattern edge of a reverse taper. Blue color resist is applied to the formed red and green picture elements by spin coating and the rear side of these elements is exposed to light to form a color filter having high flatness.
申请公布号 JPH0437804(A) 申请公布日期 1992.02.07
申请号 JP19900145822 申请日期 1990.06.04
申请人 SEIKO EPSON CORP 发明人 WATANABE HIROSHI
分类号 G02B5/20;G02F1/1335 主分类号 G02B5/20
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