发明名称 |
QUANTITY ANALYSIS SAMPLE AND ION IMPLANTATION AND SECONDARY ION MASS SPECTROMETER WITH ION IMPLANTATION FUNCTION |
摘要 |
PURPOSE:To omit a standard sample besides an analysis objective sample by providing a known amount of the same element as the analysis objective element in the analysis objective sample as an internal standard sample. CONSTITUTION:In a secondary ion mass spectrometer, an ion source 2 is provided to inject a known amount of internal standard element same as the element to be analyzed into a quantity analysis objective sample 11 as an internal standard sample. Symbol 3b shows the aperture for the ion source 2 for injecting an internal standard element and 4b shows the condenser lens for the ion source 2 for injecting an internal standard element. This system shares the system of mass separator 5 to separate mass of ion beam 18 discharged from the primary ion source 1 for analysis purpose and a system of mass separator to separate mass of ion beam 19 discharged out of the ion source 2 for internal standard element injection into the quantity analysis objective sample 11 for known amount of internal standard sample. |
申请公布号 |
JPH0438440(A) |
申请公布日期 |
1992.02.07 |
申请号 |
JP19900145139 |
申请日期 |
1990.06.02 |
申请人 |
HITACHI LTD;HITACHI INSTR ENG CO LTD |
发明人 |
TAMURA HIFUMI;IKEBE YOSHINORI;SUMIYA HIROYUKI;TOIDA HIROSHI;HIROSE HIROSHI |
分类号 |
G01N23/225;G01N1/00;G01N27/62;H01J49/26 |
主分类号 |
G01N23/225 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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