发明名称 SUBSTRATE DRYING DEVICE
摘要 PROBLEM TO BE SOLVED: To introduce a drying fluid in sufficient quantities without using a carrier gas by feeding only a drying fluid into a drying chamber, which stores a substrate being an object to be dried and can be airtightly closed, through a drying fluid guide pipe, and forcibly exhausting a gas in the drying chamber. SOLUTION: After a plurality of substrates 4 stored in a drying tank 1 are cleaned by feeding a cleaning liquid into the tank 1, the tank 1 is airtightly closed and a valve 3b is opened to actuate a vacuum pump 3, thereby exhausting a gas present in a space of the tank 1 to create a vacuum, causing a drying fluid to be introduced into the space. If the cleaning liquid in the tank 1 is discharged through a cleaning liquid discharge pipe 1a, a vacuum is produced in the tank 1, whereby a drying fluid in such a quantity that corresponds to the quantity of the discharged cleaning liquid is admitted into the tank 1. As the level of the cleaning liquid falls, a portion of the substrate 4 is exposed so theft the cleaning liquid on the surface of the substrate 4 is replaced with the fluid, thereby vaporizing the liquid to dry the substrate.
申请公布号 JP2000180055(A) 申请公布日期 2000.06.30
申请号 JP19980352591 申请日期 1998.12.11
申请人 TOHO KASEI KK;DAIKIN IND LTD 发明人 MAEDA TOKUO;WASHIMI KOJI;AIHARA MASARU;ONO MASAO
分类号 H01L21/304;F26B5/04;F26B9/06;F26B21/00;(IPC1-7):F26B5/04 主分类号 H01L21/304
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