发明名称 |
PROCESS FOR NITRIDING SILICON-CONTAINING MATERIALS |
摘要 |
A process for nitriding materials containing silicon to form a silicon nitride material predominantly in the alpha phase is disclosed which includes nitriding the silicon-containing material by subjecting it to a nitriding atmosphere containing at least nitrogen gas in combination with at least one other nitriding gas while keeping the composition of the nitriding atmosphere substantially constant by maintaining a substantially constant partial pressure of nitrogen gas during the nitriding, even though nitrogen is being consumed during the nitriding step to form the silicon nitride. |
申请公布号 |
WO9201650(A1) |
申请公布日期 |
1992.02.06 |
申请号 |
WO1991US05192 |
申请日期 |
1991.07.23 |
申请人 |
EATON CORPORATION;EDLER, JAMES, P. |
发明人 |
EDLER, JAMES, P. |
分类号 |
C01B21/068;C04B35/591 |
主分类号 |
C01B21/068 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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