发明名称 VACUUM DEPOSITING APPARATUS
摘要 PURPOSE:To deposit a thin film having a prescribed pattern by winding both ends of a beltlike metallic sheet having >=2 kinds of patterns around 2 winding drums set at a prescribed distance and interposing the sheet between a substrate and an evaporation source as a mask. CONSTITUTION:A mask 13 is a beltlike metallic sheet having the necessary through holes of necessary patterns at fixed intervals. Both ends of the mask 13 are wound around 2 winding drums 6a, 6b set at a prescribed distance so that an arbitrary pattern is located over evaporation sources 5a, 5b, 5c. By rotating the drums 6a, 6b, a desired pattern is selected from the patterns formed in the mask 13, and an arbitrary evaporation source 5a, 5b or 5c is used. The material of the selected source is evaporated, and the vapor is deposited on a substrate 4.
申请公布号 JPS5726162(A) 申请公布日期 1982.02.12
申请号 JP19800099975 申请日期 1980.07.23
申请人 HITACHI LTD 发明人 SUNAHARA KAZUO
分类号 C23C14/04;C23C14/56 主分类号 C23C14/04
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