| 摘要 |
<p>PURPOSE:To shorten the time for forming exposing data for mask production by simultaneously executing various kinds of the processing requested from process conditions at the time of the execution of exposing. CONSTITUTION:Design data 1 stored in a design data file 1 is subjected to the conversion to the format of an exposing device, the generation of special patterns and the processing for layer synthesis in a general-purpose computer 2. The results thereof are stored into a file 5 for the design data of the format of the exposing device. This design data of the format of the exposing device and respective sets of the data respectively stored in a sizing data file 6, a logical processing condition file 7, a special pattern file 8, a mirror information file 9, and a reduct information file 10 are supplied to a special purpose computer 11 by which the pre-exposing processing is executed at the time of the execution of exposing. The exposing data for mask production is thereby formed and is supplied to the exposing device 4. The total time for forming the exposing data for mask production is shortened in this way.</p> |
