发明名称 Process for forming a coating on a substrate using a silsesquioxane resin
摘要 The present invention provides a relatively simple synthesis procedure for the formation of silane hydrolyzate compositions of the formula <IMAGE> where R is hydrogen or a methyl group, n is an integer greater than about 8, and x is a number between 0 and 2. The hydrolyzate compositions are metastable in solvent solution, but become insoluble after coating on a substrate. The resins are useful as planarizing coatings for substrates such as electronic devices and can be ceramified by subjecting them to an oxidizing atmosphere at a temperature of between about 100 DEG to 1000 DEG C. to form ceramic or ceramic-like coatings on such substrates.
申请公布号 US5085893(A) 申请公布日期 1992.02.04
申请号 US19910692871 申请日期 1991.04.29
申请人 DOW CORNING CORPORATION 发明人 WEISS, KEITH D.;FRYE, CECIL L.
分类号 C08G77/04;C08G77/06;C08G77/08;C08G77/16 主分类号 C08G77/04
代理机构 代理人
主权项
地址