发明名称 |
Process for forming a coating on a substrate using a silsesquioxane resin |
摘要 |
The present invention provides a relatively simple synthesis procedure for the formation of silane hydrolyzate compositions of the formula <IMAGE> where R is hydrogen or a methyl group, n is an integer greater than about 8, and x is a number between 0 and 2. The hydrolyzate compositions are metastable in solvent solution, but become insoluble after coating on a substrate. The resins are useful as planarizing coatings for substrates such as electronic devices and can be ceramified by subjecting them to an oxidizing atmosphere at a temperature of between about 100 DEG to 1000 DEG C. to form ceramic or ceramic-like coatings on such substrates.
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申请公布号 |
US5085893(A) |
申请公布日期 |
1992.02.04 |
申请号 |
US19910692871 |
申请日期 |
1991.04.29 |
申请人 |
DOW CORNING CORPORATION |
发明人 |
WEISS, KEITH D.;FRYE, CECIL L. |
分类号 |
C08G77/04;C08G77/06;C08G77/08;C08G77/16 |
主分类号 |
C08G77/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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