Volatile liquid precursors for the chemical vapor deposition of copper,申请号US19910650332-传众专利搜索

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发明名称	Volatile liquid precursors for the chemical vapor deposition of copper
摘要
申请公布号	US5085731(A)	申请公布日期	1992.02.04
申请号	US19910650332	申请日期	1991.02.04
申请人	AIR PRODUCTS AND CHEMICALS, INC.	发明人	NORMAN, JOHN A. T.;MURATORE, BETH A.
分类号	C07F7/02;C07F7/08;C23C16/18	主分类号	C07F7/02
代理机构		代理人
主权项
地址

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