APPARATUS FOR FORMING, CORRECTING PATTERN

摘要

A means is employed to blow a gas for forming a conductive film and a gas for forming an insulating film onto the surface of a specimen while it is being irradiated with an ion beam, in order to easily and quickly form a small conductive pattern and an insulating pattern in a laminated manner, and a means is employed to cut a pattern by the irradiation with an ion beam and to form a new electrically conductive pattern by blowing a gas while the pattern is being irradiated with the ion beam in order to accomplish an electric connection between the patterns, making it possible to locally cut or connect tiny patterns.