发明名称 |
MICROWAVE INDUCED PLASMA SOURCE |
摘要 |
A microwave induced plasma source includes a coaxial waveguide made up of a cylindrical outer conductor and an inner conductor which has the form of a helical coil, a discharge tube inserted into the helical coil in the axial direction thereof, and having an inner tube for introducing a sample and an outer tube for introducing a plasma gas so that a double tube structure is formed, a discharge-tube cooling device for causing a cooling gas to flow along the outer periphery of the discharge tube in directions parallel to the axis thereof, and a microwave power source for supplying microwave power to the coaxial waveguide. When the microwave induced plasma source is used as the light source of a spectrometer or the ion source of a mass spectrometer, a trace element can be readily determined qualitatively or quantitatively.
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申请公布号 |
US5086255(A) |
申请公布日期 |
1992.02.04 |
申请号 |
US19900473430 |
申请日期 |
1990.02.01 |
申请人 |
HITACHI, LTD. |
发明人 |
OKAMOTO, YUKIO;YASUDA, MAKOTO;KOGA, MASATAKA |
分类号 |
H01J49/12;H01J49/10;H05H1/46 |
主分类号 |
H01J49/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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