| 摘要 |
PURPOSE:To enable equipment of sufficient repetition durability and excellent sensitive characteristic by overlaying a silicon wafer substrate with a resin layer containing an specific organic photochromic material as the first layer, a layer made of a polymer resin of specific oxygen permeability ad the second layer, and a antireflection film as the third layer. CONSTITUTION:A substrate of silicon wafer or the like is overlaid with a layer made of a resin containing an organic photochromic material of 5-80 wt% selected from a group made of spiropyrane based compound, spironaphthooxazine based compound, and fulgide based compound as the first layer. It is overlaid with a layer made of a polymer resin with an oxygen permeability of 1 X 10<-10> cm<3>.cm/cm<2>.s.cmHg or less as the second layer and an antireflection film as the third layer. The organic photochromic material is a spiropyrane compound represented by a formula (where R1 is a nonsubstituted or substituted alkyl group of a carbon number 1-22; R2 and R acid are substituted groups selected from among oxygen atom, hydroxy group, amino group, alkoxy group, aryl group, halogen group, cyano group, carboxy group, and nitro group; and m, n an integer of 0-4). |
