| 摘要 |
PURPOSE:To make it possible to efficiently conduct microscopic patterning on a resist film in an excellent economical efficiency without lowering the degree of preciseness by a method wherein a printed layer, consisting of ink opaque to ultraviolet, is formed in the desired shape by printing on a photoresist. CONSTITUTION:A photoresist film 2 is formed on the material to be processed 1. Then, a layer 3 of ink opaque to ultraviolet is formed by printing along the very fine positive or negative type pattern on the film 2 so as to block ultraviolet rays 4 for development to be processed. Subsequently, a developing operation is conducted by projecting ultraviolet rays 4 from both sides of the part where the layer 3 is formed, and the resist film is patternized. Then, the material to be processed 1, having a patternized resist film 2a, is etching-treated, and the film 2 and the like is removed by exfoliation, the patternization of the resist film can be conducted efficiently and in a highly economical manner without impairing accuracy, because a photolithographic method is not used. |
