发明名称 Method of forming micro-via
摘要 A method of forming a micro-via, for fabrication and design of a layout of a circuit board. A patterned conductive wiring layer is formed on the substrate. A copper layer is plated onto the substrate and the conductive wiring layer. A photoresist layer is formed on the copper layer. A part of the photoresist layer is removed to expose a part of the copper layer. Using the copper layer as a seed layer, a conductive pillar is formed on the exposed part of the copper layer. The photoresist layer is removed. The exposed plated copper layer is removed. An insulation layer is formed on surfaces of the substrate and the conductive pillar. A part of the insulation layer is removed to expose the conductive pillar. A patterned conductive wiring layer is formed on the conductive pillar.
申请公布号 US6395633(B1) 申请公布日期 2002.05.28
申请号 US20010871206 申请日期 2001.05.31
申请人 WORLD WISER ELECTRICS INC. 发明人 CHENG JAO-CHIN;HSIEH CHANG-CHIN;FAN CHIH-PENG;CHANG CHIN-CHUNG
分类号 H05K3/10;H05K3/24;H05K3/46;(IPC1-7):H01L21/44 主分类号 H05K3/10
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