LITHOGRAPHIC PROJECTION APPARATUS, DEVICE MANUFACTURING METHOD, AND DEVICE MANUFACTURED THEREBY

摘要

PURPOSE: A contaminant barrier used in a lithographic projection apparatus is provided to remove undesirable contaminants produced by a radiation source. CONSTITUTION: A lithographic projection apparatus for imaging a mask pattern in a mask onto a substrate comprises: an illumination system(IL) constructed and arranged to supply a projection beam(PB) of radiation; the first object table(MT) constructed to hold a mask(MA); the second object table constructed to hold a substrate(W); a projection system(PL) constructed and arranged to image an irradiated portion of the mask onto a target portion of the substrate; and a contaminant barrier comprising an ionizer which is constructed and arranged to ionize a gas provided in a region traversed by the projection beam.