CLEANING AND DRYING METHOD FOR SEMICONDUCTOR WAFER,申请号JP19900131535-传众专利搜索

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发明名称	CLEANING AND DRYING METHOD FOR SEMICONDUCTOR WAFER
摘要
申请公布号	JPH0426123(A)	申请公布日期	1992.01.29
申请号	JP19900131535	申请日期	1990.05.21
申请人	SHARP CORP	发明人	OKI ICHIRO
分类号	H01L21/304	主分类号	H01L21/304
代理机构		代理人
主权项
地址

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